Origin of Compressive Residual Stress in Alkoxide Derived...

Japanese Journal of Applied Physics 2008 / 9 Vol. 47; Iss. 9

Origin of Compressive Residual Stress in Alkoxide Derived PbTiO 3 Thin Film on Si Wafer

Ohno, Tomoya, Mali\uc, Babara, Fukazawa, Hiroaki, Wakiya, Naoki, Suzuki, Hisao, Matsuda, Takeshi, Kosec, Marija
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Volume:
47
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.47.7514
Date:
September, 2008
File:
PDF, 277 KB
english, 2008
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