Etching Behavior and Damage Rejuvenation of Top Electrode and Bi 3.15 Nd 0.85 Ti 3 O 12 Films Applied in Ferroelectric Random Access Memory Devices
Xie, Dan, Yu, Wenkao, Luo, Yafeng, Xue, Kanhao, Ren, Tianling, Liu, LitianVolume:
48
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.48.050209
Date:
May, 2009
File:
PDF, 1.75 MB
english, 2009