![](/img/cover-not-exists.png)
Impact of Oxide Thickness Fluctuation and Local Gate Depletion on Threshold Voltage Variation in Metal–Oxide–Semiconductor Field-Effect Transistors
Putra, Arifin Tamsir, Tsunomura, Takaaki, Nishida, Akio, Kamohara, Shiro, Takeuchi, Kiyoshi, Hiramoto, ToshiroVolume:
48
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.48.064504
Date:
June, 2009
File:
PDF, 185 KB
english, 2009