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Effect on Two-Step Polishing Process of Electrochemical Mechanical Planarization and Chemical–Mechanical Planarization on Planarization
Jeong, Sukhoon, Joo, Sukbae, Kim, Hyoungjae, Kim, Sungryul, Jeong, HaedoVolume:
48
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.48.066512
Date:
June, 2009
File:
PDF, 227 KB
english, 2009