Effect of Oxygen Precipitation in Nitrogen-Doped Annealed...

Japanese Journal of Applied Physics 2010 / 8 Vol. 49; Iss. 8

Effect of Oxygen Precipitation in Nitrogen-Doped Annealed Silicon Wafers on Thermal Strain Induced by Rapid Thermal Processing

Araki, Koji, Sudo, Haruo, Aoki, Tatsuhiko, Senda, Takeshi, Isogai, Hiromichi, Tsubota, Hiroyuki, Miyashita, Moriya, Matsumura, Hisashi, Saito, Hiroyuki, Maeda, Susumu, Kashima, Kazuhiko, Izunome, Koji
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Volume:
49
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.49.080205
Date:
August, 2010
File:
PDF, 746 KB
english, 2010
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