Analysis of A Novel Slurry Injection System in Chemical...

Japanese Journal of Applied Physics 2011 / 5 Vol. 50; Iss. 5

Analysis of A Novel Slurry Injection System in Chemical Mechanical Planarization

Meled, Anand, Zhuang, Yun, Sampurno, Yasa Adi, Theng, Siannie, Jiao, Yubo, Borucki, Leonard, Philipossian, Ara
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Volume:
50
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.50.05EC01
Date:
May, 2011
File:
PDF, 746 KB
english, 2011
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