A Highly Sensitive Inorganic Resist for Directly Fabricating Thermally Stable Oxide Pattern on Si Substrate by Low-Energy Electron-Beam Direct Writing
Matsuda, Kazuhiro, Ushio, Shoji, Hirokawa, Yuki, Gotou, Taiki, Kaneko, TadaakiVolume:
50
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.50.06GD02
Date:
June, 2011
File:
PDF, 711 KB
english, 2011