Nanoimprint Molds with Circumferentially Aligned Patterns...

Japanese Journal of Applied Physics 2011 / 11 Vol. 50

Nanoimprint Molds with Circumferentially Aligned Patterns Fabricated by Liftoff Process

Okada, Takeru, Fujimori, Jiro, Iida, Tetsuya
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Volume:
50
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.50.126502
Date:
November, 2011
File:
PDF, 931 KB
english, 2011
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