Robust Ultralow-$k$ Dielectric (Fluorocarbon) Deposition by...

Japanese Journal of Applied Physics 2012 / 5 Vol. 51

Robust Ultralow-$k$ Dielectric (Fluorocarbon) Deposition by Microwave Plasma-Enhanced Chemical Vapor Deposition

Kikuchi, Yoshiyuki, Miyatani, Kotaro, Kobayashi, Yasuo, Kawamura, Kohei, Nemoto, Takenao, Nakamura, Masahiro, Matsumoto, Hirokazu, Ito, Azumi, Shirotori, Akihide, Nozawa, Toshihisa, Matsuoka, Takaaki
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
51
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.51.05EC02
Date:
May, 2012
File:
PDF, 563 KB
english, 2012
Conversion to is in progress
Conversion to is failed