Etching Enhancement Followed by Nitridation on Low-...

Japanese Journal of Applied Physics 2013 / 02 Vol. 52; Iss. 2R

Etching Enhancement Followed by Nitridation on Low- k SiOCH Film in Ar/C 5 F 10 O Plasma

Miyawaki, Yudai, Shibata, Emi, Kondo, Yusuke, Takeda, Keigo, Kondo, Hiroki, Ishikawa, Kenji, Okamoto, Hidekazu, Sekine, Makoto, Hori, Masaru
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Volume:
52
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.52.020204
Date:
February, 2013
File:
PDF, 344 KB
english, 2013
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