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Effect of thermalization distance on chemical gradient of line-and-space patterns with 7 nm half-pitch in chemically amplified extreme ultraviolet resists
Kozawa, Takahiro, Santillan, Julius Joseph, Itani, ToshiroVolume:
54
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.54.066501
Date:
June, 2015
File:
PDF, 313 KB
english, 2015