Nucleation and Growth of the HfO 2...

Chemistry of Materials 2015 / 08

Nucleation and Growth of the HfO 2 Dielectric Layer for Graphene-Based Devices

Oh, Il-Kwon, Tanskanen, Jukka, Jung, Hanearl, Kim, Kangsik, Lee, Mi Jin, Lee, Zonghoon, Lee, Seoung-Ki, Ahn, Jong-Hyun, Lee, Chang Wan, Kim, Kwanpyo, Kim, Hyungjun, Lee, Han-Bo-Ram
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Language:
english
Journal:
Chemistry of Materials
DOI:
10.1021/acs.chemmater.5b01226
Date:
August, 2015
File:
PDF, 3.55 MB
english, 2015
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