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A low-temperature and high-quality radical-assisted oxidation process utilizing a remote ultraviolet ozone source for high-performance SiGe/Si MOSFETs
Song, Young-Joo, Mheen, Bongki, Kang, Jin-Young, Lee, Young-Shik, Lee, Nae-Eung, Kim, Jeong-Hoon, Song, Jong-In, Shim, Kyu-HwanVolume:
19
Language:
english
Journal:
Semiconductor Science and Technology
DOI:
10.1088/0268-1242/19/7/002
Date:
July, 2004
File:
PDF, 287 KB
english, 2004