Time-Dependent Dielectric Breakdown of Interlevel...

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Time-Dependent Dielectric Breakdown of Interlevel Dielectrics for Copper Metallization

H. Miyazaki, K. Hinode, Y. Homma, N. Kobayashi
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Year:
1996
Language:
english
DOI:
10.1143/JJAP.35.1685
File:
PDF, 175 KB
english, 1996
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