Hydrogen Diffusion and Chemical Reactivity with Water on...

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Hydrogen Diffusion and Chemical Reactivity with Water on Nearly Ideally H-terminated Si(100) Surface

Z. Wang, H. Noda, Y. Nonogaki, N. Yabumoto, T. Urisu
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Year:
2002
Language:
english
DOI:
10.1143/JJAP.41.4275
File:
PDF, 89 KB
english, 2002
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