![](/img/cover-not-exists.png)
Hydrogen Diffusion and Chemical Reactivity with Water on Nearly Ideally H-terminated Si(100) Surface
Z. Wang, H. Noda, Y. Nonogaki, N. Yabumoto, T. UrisuYear:
2002
Language:
english
DOI:
10.1143/JJAP.41.4275
File:
PDF, 89 KB
english, 2002