Inductively Coupled Plasma Etching of Silicon Using Solid...

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Inductively Coupled Plasma Etching of Silicon Using Solid Iodine as an Etching Gas Source

A. Matsutani, H. Ohtsuki, F. Koyama
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Year:
2011
Language:
english
DOI:
10.1143/JJAP.50.06GG07
File:
PDF, 853 KB
english, 2011
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