Monitoring and control of RF thermal plasma diamond...

Measurement Science and Technology 2004 / 01 Vol. 15; Iss. 1

Monitoring and control of RF thermal plasma diamond deposition via substrate biasing

Berghaus, Jörg Oberste, Meunier, Jean-Luc, Gitzhofer, François
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
15
Language:
english
Journal:
Measurement Science and Technology
DOI:
10.1088/0957-0233/15/1/023
Date:
January, 2004
File:
PDF, 213 KB
english, 2004
Conversion to is in progress
Conversion to is failed