Range Distribution of Implanted Arsenic in Silicon Dioxide

Range Distribution of Implanted Arsenic in Silicon Dioxide

Tsukamoto, Katsuhiro, Akasaka, Youichi, Horie, Kazuo
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Volume:
16
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.16.663
Date:
April, 1977
File:
PDF, 282 KB
1977
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