Incorporation of Oxygen into Silicon during Pulsed-Laser...

Japanese Journal of Applied Physics 1980 / 7 Vol. 19; Iss. 7

Incorporation of Oxygen into Silicon during Pulsed-Laser Irradiation

Hoh, Koichiro, Koyama, Hiroshi, Uda, Keiichiro, Miura, Yoshio
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Volume:
19
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.19.L375
Date:
July, 1980
File:
PDF, 727 KB
1980
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