Anodic Dissolution Behaviour of Si- and Ti-Implanted Iron

Japanese Journal of Applied Physics 1983 / 3 Vol. 22; Iss. Part 2, No

Anodic Dissolution Behaviour of Si- and Ti-Implanted Iron

Okabe, Yoshio, Iwaki, Masaya, Takahashi, Katsuo, Yoshida, Kiyota
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
22
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.22.L165
Date:
March, 1983
File:
PDF, 155 KB
english, 1983
Conversion to is in progress
Conversion to is failed