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Homogeneous Dopant Distribution of Silicon Crystal Grown by Vertical Magnetic Field-Applied Czochralski Method
Hoshikawa, Keigo, Kohda, Hiroki, Hirata, HiroshiVolume:
23
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.23.L37
Date:
January, 1984
File:
PDF, 509 KB
1984