Maskless Ion Beam Assisted Etching of Si Using Chlorine Gas

Japanese Journal of Applied Physics 1985 / 3 Vol. 24; Iss. Part 2, No

Maskless Ion Beam Assisted Etching of Si Using Chlorine Gas

Ochiai, Yukinori, Shihoyama, Kazuhiko, Masuyama, Akio, Gamo, Kenji, Shiokawa, Takao, Toyoda, Koichi, Namba, Susumu
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Volume:
24
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.24.L169
Date:
March, 1985
File:
PDF, 1.13 MB
english, 1985
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