Effects of Excited Plasma Species on Silicon Oxide Films Formed by Microwave Plasma CVD
Fukuda, Takuya, Ohue, Michio, Momma, Naohiro, Suzuki, Kazuo, Sonobe, TadashiVolume:
28
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.28.1035
Date:
June, 1989
File:
PDF, 515 KB
english, 1989