Spatial Distribution of SiH 3 Radicals in RF Silane Plasma
Itabashi, Naoshi, Nishiwaki, Nobuki, Magane, Mitsuo, Naito, Susumu, Goto, Toshio, Matsuda, Akihisa, Yamada, Chikashi, Hirota, EiziVolume:
29
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.29.L505
Date:
March, 1990
File:
PDF, 515 KB
1990