High-Power Microwave-Induced Plasma Source for Trace...

Japanese Journal of Applied Physics 1990 / 4 Vol. 29; Iss. Part 2, No

High-Power Microwave-Induced Plasma Source for Trace Element Analysis

Okamoto, Yukio, Yasuda, Makoto, Murayama, Seiichi
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Volume:
29
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.29.L670
Date:
April, 1990
File:
PDF, 624 KB
english, 1990
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