Stress-Induced Contact Failures in Al-Si/n-Si Structures

Japanese Journal of Applied Physics 1990 / 5 Vol. 29; Iss. Part 2, No

Stress-Induced Contact Failures in Al-Si/n-Si Structures

Mayumi, Shuichi, Shishino, Masahumi, Ueda, Seiji
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Volume:
29
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.29.L743
Date:
May, 1990
File:
PDF, 459 KB
1990
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