The Resolution Limit of the Resist Silylation Process in...

Japanese Journal of Applied Physics 1991 / 1 Vol. 30; Iss. Part 1, No

The Resolution Limit of the Resist Silylation Process in i-Line Lithography

Takehara, Daisuke, Ota, Tsuneo, Tanimoto, Keisuke, Kawabata, Ryohei, Shibayama, Hikou
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Volume:
30
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.30.190
Date:
January, 1991
File:
PDF, 287 KB
english, 1991
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