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Impurity Diffusion Barrier Effect of Ultra-Thin Plasma-Nitrided a-Si:H Overlayer on SnO 2 /Glass Substrate
Hayashi, Tsukasa, Kawabata, Keishi, Yamada, Keiichi, Miyazaki, Seiichi, Hirose, MasatakaVolume:
30
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.30.L675
Date:
April, 1991
File:
PDF, 611 KB
english, 1991