A Comparison of Cl 2 and...

Japanese Journal of Applied Physics 1993 / 6 Vol. 32; Iss. Part 1, No

A Comparison of Cl 2 and HBr/Cl 2 -Based Polysilicon Etch Chemistries: Impact on SiO 2 and Si Substrate Damage

Rembetski, John F., Chan, Y D., Boden, E., Gu, Tieer, Awadelkarim, O. O., Ditizio, R. A., Fonash, S. J., Li, Xiaoyu, Viswanathan, C. R.
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Volume:
32
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.32.3023
Date:
June, 1993
File:
PDF, 400 KB
english, 1993
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