Comprehensive Study of Lateral Grain Growth in Poly-Si...

Japanese Journal of Applied Physics 1994 / 10 Vol. 33; Iss. Part 1, No

Comprehensive Study of Lateral Grain Growth in Poly-Si Films by Excimer Laser Annealing and Its Application to Thin Film Transistors

Kuriyama, Hiroyuki, Nohda, Tomoyuki, Aya, Yoichirou, Kuwahara, Takashi, Wakisaka, Kenichiro, Kiyama, Seiichi, Tsuda, Shinya
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Volume:
33
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.33.5657
Date:
October, 1994
File:
PDF, 504 KB
english, 1994
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