Oxide Etching Using Surface Wave Coupled Plasma
Akimoto, Takeshi, Ikawa, Eiji, Sango, Toshiaki, Komachi, Kyouichi, Katayama, Katuo, Ebata, TosikiVolume:
33
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.33.7037
Date:
December, 1994
File:
PDF, 706 KB
english, 1994