Anisotropic Etching Process for Submicron Patterning of Nb...

Japanese Journal of Applied Physics 1995 / 3 Vol. 34; Iss. Part 1, No

Anisotropic Etching Process for Submicron Patterning of Nb Using CF$_{\bf 4}$

Akaike, Hiroyuki, Watanabe, Takeaki, Fujimaki, Akira, Hayakawa, Hisao
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Volume:
34
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.34.1515
Date:
March, 1995
File:
PDF, 719 KB
english, 1995
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