Plasma Immersion Ion Implantation for Electronic Materials

Japanese Journal of Applied Physics 1996 / 2 Vol. 35; Iss. Part 1, No

Plasma Immersion Ion Implantation for Electronic Materials

Jones, Erin C., Linder, Barry P., Cheung, Nathan W.
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Volume:
35
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.35.1027
Date:
February, 1996
File:
PDF, 2.32 MB
1996
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