Selective Plasma Etching for High-Aspect-Ratio Oxide...

Japanese Journal of Applied Physics 1998 / 1 Vol. 37; Iss. Part 1, No

Selective Plasma Etching for High-Aspect-Ratio Oxide Contact Holes

Kim, Yun-Sang, Wei, Peter Ta-Chin, Tynan, George R., Charatan, Robert, Hemker, Dave
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Volume:
37
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.37.327
Date:
January, 1998
File:
PDF, 1020 KB
1998
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