Thermoelectric Properties of and Dopant Distribution in SiC...

Japanese Journal of Applied Physics 1999 / 8 Vol. 38; Iss. Part 1, No

Thermoelectric Properties of and Dopant Distribution in SiC Thin Films

Kawahara, Toshio, Uchino, Hiroko, Inai, Hiroshi, Kato, Kazuhiko, Okamoto, Yoichi, Miyakawa, andToru
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Volume:
38
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.38.4852
Date:
August, 1999
File:
PDF, 109 KB
english, 1999
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