Cleaning by Brush-Scrubbing of Chemical Mechanical Polished...

Japanese Journal of Applied Physics 1999 / 9 Vol. 38; Iss. Part 1, No

Cleaning by Brush-Scrubbing of Chemical Mechanical Polished Silicon Surfaces Using Ozonized Water and Diluted HF

Kurokawa, Yoshiaki, Hirose, Harumichi, Moriya, Takahiko, Kimura, Chouichi
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Volume:
38
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.38.5040
Date:
September, 1999
File:
PDF, 548 KB
english, 1999
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