Lateral Solid Phase Recrystallization from the Crystal Seed...

Japanese Journal of Applied Physics 2001 / 4 Vol. 40; Iss. Part 1, No

Lateral Solid Phase Recrystallization from the Crystal Seed in Ge-Ion-Implanted Amorphous Silicon Films by Repetition Rapid Thermal Annealing

Seo, Jin-Wook, Kokubo, Yoshitaka, Aya, Yoichiro, Nohda, Tomoyuki, Hamada, Hiroki, Kuwano, Hiroshi
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Volume:
40
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.40.2150
Date:
April, 2001
File:
PDF, 459 KB
english, 2001
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