Influence of Nitrogen Doping on the Barrier Properties of...

Influence of Nitrogen Doping on the Barrier Properties of Sputtered Tantalum Carbide Films for Copper Metallization

Wang, Shui Jinn, Tsai, Hao Yi, Sun, Shi Chung, Shiao, Ming Hua
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Volume:
40
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.40.6212
Date:
November, 2001
File:
PDF, 721 KB
english, 2001
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