Low-Damage Indium Phosphide Sidewall Formation by Reactive...

Japanese Journal of Applied Physics 2002 / 2 Vol. 41; Iss. Part 1, No

Low-Damage Indium Phosphide Sidewall Formation by Reactive Ion Etching

Saga, Nobuhiro, Masuda, Takeyoshi, Kishi, Takeshi, Murata, Michio, Yamaguchi, Akira, Katsuyama, Tsukuru
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Volume:
41
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.41.1072
Date:
February, 2002
File:
PDF, 111 KB
english, 2002
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