Simulation of Photoresist Thermal Flow Process with Viscous...

Japanese Journal of Applied Physics 2004 / 9 Vol. 43; Iss. 9A

Simulation of Photoresist Thermal Flow Process with Viscous Flow Model

Chung, Won-Young, Kim, Tai-Kyung, Lee, Yero, Yoon, Jin-Young, Kim, Hyun-Woo, Park, Young-Kwan, Kong, Jeong-Taek
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Volume:
43
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.43.6020
Date:
September, 2004
File:
PDF, 371 KB
english, 2004
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