Fabrication and Properties of Ge-Doped (Bi,Nd)...

Japanese Journal of Applied Physics 2004 / 9 Vol. 43; Iss. 9B

Fabrication and Properties of Ge-Doped (Bi,Nd) 4 Ti 3 O 12 Thin Films by Chemical Solution Deposition

Sakamoto, Wataru, Mizutani, Yu-ki, Iizawa, Naoya, Yogo, Toshinobu, Hayashi, Takashi, Hirano, Shin-ichi
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Volume:
43
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.43.6599
Date:
September, 2004
File:
PDF, 299 KB
english, 2004
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