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Sub-55 nm Etch Process Using Stacked-Mask Process
Sakai, Itsuko, Abe, Junko, Hayashi, Hisataka, Taniguchi, Yasuyuki, Kato, Hirokazu, Onishi, Yasunobu, Ohiwa, TokuhisaVolume:
46
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.46.4286
Date:
July, 2007
File:
PDF, 736 KB
english, 2007