Which Mask is Preferred for Sub-60 nm Node Imaging?

Japanese Journal of Applied Physics 2007 / 9 Vol. 46; Iss. 9B

Which Mask is Preferred for Sub-60 nm Node Imaging?

Kim, Sung-Hyuck, Kim, Soon-Ho, Kim, Yong-Hoon, Lee, Jeung-Woo, Woo, Sang-Gyun, Cho, Han-Ku, Oh, Hye-Keun
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Volume:
46
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.46.6124
Date:
September, 2007
File:
PDF, 543 KB
english, 2007
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