Mechanism of Suppressed Change in Effective Work Functions for Impurity-Doped Fully Silicided NiSi Electrodes on Hf-Based Gate Dielectrics
Manabe, Kenzo, Hase, Takashi, Tatsumi, Toru, Watanabe, Heiji, Yasutake, KiyoshiVolume:
46
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.46.91
Date:
January, 2007
File:
PDF, 1.34 MB
english, 2007