Thermally Stable NiSi Gate Electrode with TiN Barrier Metal...

Japanese Journal of Applied Physics 2010 / 4 Vol. 49; Iss. 4

Thermally Stable NiSi Gate Electrode with TiN Barrier Metal for High-Density NAND Flash Memory Devices

Whang, Sung-Jin, Joo, Moon-Sig, Seo, Bo-Min, Chang, Kyoung-Eun, Kim, Won-Kyu, Jung, Tae-Woo, Kim, Gyu-Hyun, Lim, Jung-Yeon, Kim, Ka-Young, Hong, Kwon, Park, Sung-Ki
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Volume:
49
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.49.04DA17
Date:
April, 2010
File:
PDF, 1.41 MB
english, 2010
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