Nonlinear Behavior of Decrease in Reflectivity of...

Japanese Journal of Applied Physics 2011 / 6 Vol. 50; Iss. 6

Nonlinear Behavior of Decrease in Reflectivity of Multilayer Mirrors for Extreme Ultraviolet Lithography Optics by High-Flux Extreme Ultraviolet Irradiation in Various Vacuum Environments

Niibe, Masahito, Koida, Keigo, Kakutani, Yukinobu, Nakayama, Takahiro, Terashima, Shigeru, Miyake, Akira, Kubo, Hiroyoshi, Matsunari, Shuichi, Aoki, Takashi, Kawata, Shintaro
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Volume:
50
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.50.06GB05
Date:
June, 2011
File:
PDF, 683 KB
english, 2011
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