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Preparation and Electrical Characterization of CeO$_{2}$ Films for Gate Dielectrics Application: Comparative Study of Chemical Vapor Deposition and Atomic Layer Deposition Processes
Kouda, Miyuki, Ozawa, Kenji, Kakushima, Kuniyuki, Ahmet, Parhat, Iwai, Hiroshi, Urabe, Yuji, Yasuda, TetsujiVolume:
50
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.50.10PA06
Date:
October, 2011
File:
PDF, 290 KB
english, 2011