Gas Flow Characteristics in a Plasma Process Chamber and...

Gas Flow Characteristics in a Plasma Process Chamber and Proposal of New Pulse-Controlled Gas Injection Method Using Interference Matrix Operation for Rapid Stabilization of Gas Pressure

Morishita, Sadaharu, Goto, Tetsuya, Shirai, Yasuyuki, Ohmi, Tadahiro
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Volume:
51
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.51.016001
Date:
January, 2012
File:
PDF, 684 KB
english, 2012
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