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Fast Formation of Conductive Material by Simultaneous Chemical Process for Infilling Through-Silicon Via
Kawakita, Jin, Chikyow, ToyohiroVolume:
51
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.51.06FG11
Date:
June, 2012
File:
PDF, 644 KB
english, 2012