Ge incorporated epitaxy of (110) rutile TiO2 on (100) Ge single crystal at low temperature by pulsed laser deposition
Nagata, Takahiro, Kobashi, Kazuyoshi, Yamashita, Yoshiyuki, Yoshikawa, Hideki, Paulsamy, Chinnamuthu, Suzuki, Yoshihisa, Nabatame, Toshihide, Ogura, Atsushi, Chikyow, ToyohiroLanguage:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2015.08.031
Date:
August, 2015
File:
PDF, 1.39 MB
english, 2015